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* Suggested maximum power densities are based on using a sputter up orientation with optimal thermal transfer from target to the sputter hode cooling well.
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Copper Cu - Sputtering Target - Material Information
Supplier of Metals Alloys Ceramics Polymers Compounds Intermetallics and Composites for research and industrial markets. View our small quantity Catalogue.
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Copper sputtering target diam. × thickness 2.00 in. × 0.25 in. 99.95% trace metals basis; CAS Number: 7440-50-8; EC Number: 231-159-6; ...
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